{"id":66,"date":"2025-06-08T13:20:53","date_gmt":"2025-06-08T04:20:53","guid":{"rendered":"http:\/\/gauss.int.ee.tut.ac.jp\/?page_id=66"},"modified":"2026-04-26T15:57:31","modified_gmt":"2026-04-26T06:57:31","slug":"%e7%a0%94%e7%a9%b6%e7%92%b0%e5%a2%83-facilities","status":"publish","type":"page","link":"https:\/\/gauss.int.ee.tut.ac.jp\/?page_id=66","title":{"rendered":"\u7814\u7a76\u74b0\u5883 \/\/ Facilities"},"content":{"rendered":"\n<div class=\"wp-block-group\"><div class=\"wp-block-group__inner-container is-layout-constrained wp-block-group-is-layout-constrained\">\n<h2 class=\"wp-block-heading\">EB\u84b8\u7740\u88c5\u7f6e \/\/ e-beam evaporation<\/h2>\n\n\n\n<div class=\"wp-block-columns is-layout-flex wp-container-core-columns-is-layout-8f761849 wp-block-columns-is-layout-flex\">\n<div class=\"wp-block-column is-layout-flow wp-block-column-is-layout-flow\">\n<figure class=\"wp-block-image size-full\"><img loading=\"lazy\" decoding=\"async\" width=\"426\" height=\"354\" src=\"https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/SANVAC_ED-1600.png\" alt=\"e-beam (EB) evaporation facility\" class=\"wp-image-67\" srcset=\"https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/SANVAC_ED-1600.png 426w, https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/SANVAC_ED-1600-300x249.png 300w\" sizes=\"auto, (max-width: 426px) 100vw, 426px\" \/><\/figure>\n<\/div>\n\n\n\n<div class=\"wp-block-column is-layout-flow wp-block-column-is-layout-flow\">\n<ul class=\"wp-block-list\">\n<li>TI, Al\u306a\u3069\u306e\u91d1\u5c5e\u6750\u6599\u8584\u819c\u306e\u5f62\u6210<br>Metal film deposition, such as Ti, Al, etc.<\/li>\n\n\n\n<li>\u6c34\u6676\u632f\u52d5\u5b50\u3092\u4f7f\u3063\u305f\u819c\u539a\u306e\u305d\u306e\u5834\u30e2\u30cb\u30bf\u30fc\u304c\u53ef\u80fd<br>In-situ deposition thickness control by X-tal monitor<\/li>\n\n\n\n<li>\u5c0f\u7247\u8a66\u6599\u304b\u30894\u30a4\u30f3\u30c1\u30a6\u30a7\u30cf\u306b\u5bfe\u5fdc<br>Accept small pieces to 4-inch wafers.<\/li>\n<\/ul>\n<\/div>\n<\/div>\n<\/div><\/div>\n\n\n\n<hr class=\"wp-block-separator has-alpha-channel-opacity\"\/>\n\n\n\n<h2 class=\"wp-block-heading\">GaN\u7528\u306eICP-RIE \/\/ ICP-RIE for GaN dry etching<\/h2>\n\n\n\n<div class=\"wp-block-columns is-layout-flex wp-container-core-columns-is-layout-8f761849 wp-block-columns-is-layout-flex\">\n<div class=\"wp-block-column is-layout-flow wp-block-column-is-layout-flow\">\n<ul class=\"wp-block-list\">\n<li>\u5869\u7d20\u7cfb\u30ac\u30b9\u3092\u7528\u3044\u305f\u9ad8\u901f\u30a8\u30c3\u30c1\u30f3\u30b0\u88c5\u7f6e<br>High throughput dry etching using Cl gas.<\/li>\n\n\n\n<li>Cl<sub>2<\/sub>, SiCl<sub>4<\/sub>\u3092\u7528\u3044\u305f\u30c9\u30e9\u30a4\u30a8\u30c3\u30c1\u30f3\u30b0\u304c\u53ef\u80fd<br>Cl<sub>2<\/sub>, SiCl<sub>4<\/sub> gases are available for dry etching.\u3000<\/li>\n\n\n\n<li>\u5c0f\u7247\u8a66\u6599\u304b\u30894\u30a4\u30f3\u30c1\u30a6\u30a7\u30cf\u306b\u5bfe\u5fdc<br>Accept small pieces to 4-inch wafers.<\/li>\n<\/ul>\n<\/div>\n\n\n\n<div class=\"wp-block-column is-layout-flow wp-block-column-is-layout-flow\">\n<figure class=\"wp-block-image size-full is-resized\"><img loading=\"lazy\" decoding=\"async\" width=\"298\" height=\"376\" src=\"https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/RIE-101iPH.png\" alt=\"ICP-RIE\" class=\"wp-image-80\" style=\"width:227px;height:auto\" srcset=\"https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/RIE-101iPH.png 298w, https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/RIE-101iPH-238x300.png 238w\" sizes=\"auto, (max-width: 298px) 100vw, 298px\" \/><\/figure>\n<\/div>\n<\/div>\n\n\n\n<hr class=\"wp-block-separator has-alpha-channel-opacity\"\/>\n\n\n\n<h2 class=\"wp-block-heading\">4-inch wafer probing station<\/h2>\n\n\n\n<div class=\"wp-block-columns is-layout-flex wp-container-core-columns-is-layout-8f761849 wp-block-columns-is-layout-flex\">\n<div class=\"wp-block-column is-layout-flow wp-block-column-is-layout-flow\">\n<figure class=\"wp-block-image size-large is-resized\"><img loading=\"lazy\" decoding=\"async\" width=\"768\" height=\"1024\" src=\"https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/4inch_waferprober-768x1024.jpg\" alt=\"\" class=\"wp-image-92\" style=\"width:222px;height:auto\" srcset=\"https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/4inch_waferprober-768x1024.jpg 768w, https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/4inch_waferprober-225x300.jpg 225w, https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/4inch_waferprober-1152x1536.jpg 1152w, https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/4inch_waferprober-1536x2048.jpg 1536w, https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/4inch_waferprober-scaled.jpg 1920w\" sizes=\"auto, (max-width: 768px) 100vw, 768px\" \/><\/figure>\n<\/div>\n\n\n\n<div class=\"wp-block-column is-layout-flow wp-block-column-is-layout-flow\">\n<ul class=\"wp-block-list\">\n<li>4\u30a4\u30f3\u30c1\u30a6\u30a7\u30cf\u30fc\u5bfe\u5fdc\u30d7\u30ed\u30fc\u30d0\u30fc<br>Accept small pieces to 4-inch wafers<\/li>\n\n\n\n<li>4\u6a5f\u306e\u7cbe\u5bc6\u30de\u30cb\u30d4\u30e5\u30ec\u30fc\u30bf<br>Four precision manipulators for probing<\/li>\n\n\n\n<li>\u540c\u8ef8\u30d7\u30ed\u30fc\u30d6\u91dd\u3092\u4f7f\u3063\u305f\u5fae\u5c0f\u96fb\u6d41\u8a08\u6e2c<br>Coaxial probing needles for low noise measurement<\/li>\n<\/ul>\n<\/div>\n<\/div>\n\n\n\n<hr class=\"wp-block-separator has-alpha-channel-opacity\"\/>\n\n\n\n<h2 class=\"wp-block-heading\">2-inch probing station<\/h2>\n\n\n\n<div class=\"wp-block-columns is-layout-flex wp-container-core-columns-is-layout-8f761849 wp-block-columns-is-layout-flex\">\n<div class=\"wp-block-column is-layout-flow wp-block-column-is-layout-flow\">\n<ul class=\"wp-block-list\">\n<li>2\u30a4\u30f3\u30c1\u30a6\u30a7\u30cf\u30fc\u5bfe\u5fdc\u30d7\u30ed\u30fc\u30d0\u30fc<br>Accept small pieces to 2-inch wafers<\/li>\n\n\n\n<li>3\u6a5f\u306e\u7cbe\u5bc6\u30de\u30cb\u30d4\u30e5\u30ec\u30fc\u30bf<br>Three precision manipulators for probing<\/li>\n\n\n\n<li>\u540c\u8ef8\u30d7\u30ed\u30fc\u30d6\u91dd\u3092\u4f7f\u3063\u305f\u5fae\u5c0f\u96fb\u6d41\u8a08\u6e2c<br>Coaxial probing needles for low noise measurement<\/li>\n<\/ul>\n<\/div>\n\n\n\n<div class=\"wp-block-column is-layout-flow wp-block-column-is-layout-flow\">\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"1024\" height=\"768\" src=\"https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/2inch_wafer_prober_-1024x768.jpg\" alt=\"\" class=\"wp-image-91\" srcset=\"https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/2inch_wafer_prober_-1024x768.jpg 1024w, https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/2inch_wafer_prober_-300x225.jpg 300w, https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/2inch_wafer_prober_-768x576.jpg 768w, https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/2inch_wafer_prober_-1536x1152.jpg 1536w, https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/2inch_wafer_prober_-2048x1536.jpg 2048w\" sizes=\"auto, (max-width: 1024px) 100vw, 1024px\" \/><\/figure>\n<\/div>\n<\/div>\n\n\n\n<hr class=\"wp-block-separator has-alpha-channel-opacity\"\/>\n\n\n\n<h2 class=\"wp-block-heading\">Semiconductor Parameter Analyzer<\/h2>\n\n\n\n<div class=\"wp-block-columns is-layout-flex wp-container-core-columns-is-layout-8f761849 wp-block-columns-is-layout-flex\">\n<div class=\"wp-block-column is-layout-flow wp-block-column-is-layout-flow\">\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"1024\" height=\"768\" src=\"https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/B1500A-1024x768.jpg\" alt=\"\" class=\"wp-image-88\" srcset=\"https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/B1500A-1024x768.jpg 1024w, https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/B1500A-300x225.jpg 300w, https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/B1500A-768x576.jpg 768w, https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/B1500A-1536x1152.jpg 1536w, https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/B1500A-2048x1536.jpg 2048w\" sizes=\"auto, (max-width: 1024px) 100vw, 1024px\" \/><\/figure>\n<\/div>\n\n\n\n<div class=\"wp-block-column is-layout-flow wp-block-column-is-layout-flow\">\n<ul class=\"wp-block-list\">\n<li>\u534a\u5c0e\u4f53\u30d1\u30e9\u30e1\u30fc\u30bf\u30a2\u30ca\u30e9\u30a4\u30b6\u30fc B1500A ( Agilent Technologies)<br>Semiconductor parameter analyzer B1500A (Agilent Technologies)<\/li>\n\n\n\n<li>\u30bd\u30fc\u30b9\u30e1\u30b8\u30e3\u30fc\u30e6\u30cb\u30c3\u30c8\uff08SMU) 6\u57fa<br>6 Source Measure Unit<\/li>\n<\/ul>\n<\/div>\n<\/div>\n\n\n\n<hr class=\"wp-block-separator has-alpha-channel-opacity\"\/>\n\n\n\n<div class=\"wp-block-columns is-layout-flex wp-container-core-columns-is-layout-8f761849 wp-block-columns-is-layout-flex\">\n<div class=\"wp-block-column is-layout-flow wp-block-column-is-layout-flow\">\n<ul class=\"wp-block-list\">\n<li>LCR\u30e1\u30fc\u30bf 4284A (Agilent Technologies)<br>LCR meter 4824A (Agilent Technologies)<\/li>\n\n\n\n<li>MOS\u30ad\u30e3\u30d1\u30b7\u30bf\u306a\u3069\u306eC-V, conductance\u6e2c\u5b9a<br>C-V and conductance characterization of MOS capacitors<\/li>\n\n\n\n<li>20 Hz &#8211; 1 MHz<\/li>\n<\/ul>\n<\/div>\n\n\n\n<div class=\"wp-block-column is-layout-flow wp-block-column-is-layout-flow\">\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"1024\" height=\"768\" src=\"https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/LCR-meter-1024x768.jpg\" alt=\"\" class=\"wp-image-87\" srcset=\"https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/LCR-meter-1024x768.jpg 1024w, https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/LCR-meter-300x225.jpg 300w, https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/LCR-meter-768x576.jpg 768w, https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/LCR-meter-1536x1152.jpg 1536w, https:\/\/gauss.int.ee.tut.ac.jp\/wp-content\/uploads\/2025\/06\/LCR-meter-2048x1536.jpg 2048w\" sizes=\"auto, (max-width: 1024px) 100vw, 1024px\" \/><\/figure>\n<\/div>\n<\/div>\n\n\n\n<p class=\"wp-block-paragraph\"><\/p>\n","protected":false},"excerpt":{"rendered":"<p>EB\u84b8\u7740\u88c5\u7f6e \/\/ e-beam evaporation GaN\u7528\u306eICP-RIE \/\/ ICP-RIE for GaN dry etching 4-inch wafer probing station 2-inch p &hellip; <a href=\"https:\/\/gauss.int.ee.tut.ac.jp\/?page_id=66\">\u7d9a\u304d\u3092\u8aad\u3080 <span class=\"meta-nav\">&rarr;<\/span><\/a><\/p>\n","protected":false},"author":1,"featured_media":0,"parent":18,"menu_order":2,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"class_list":["post-66","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/gauss.int.ee.tut.ac.jp\/index.php?rest_route=\/wp\/v2\/pages\/66","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/gauss.int.ee.tut.ac.jp\/index.php?rest_route=\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/gauss.int.ee.tut.ac.jp\/index.php?rest_route=\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/gauss.int.ee.tut.ac.jp\/index.php?rest_route=\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/gauss.int.ee.tut.ac.jp\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=66"}],"version-history":[{"count":14,"href":"https:\/\/gauss.int.ee.tut.ac.jp\/index.php?rest_route=\/wp\/v2\/pages\/66\/revisions"}],"predecessor-version":[{"id":100,"href":"https:\/\/gauss.int.ee.tut.ac.jp\/index.php?rest_route=\/wp\/v2\/pages\/66\/revisions\/100"}],"up":[{"embeddable":true,"href":"https:\/\/gauss.int.ee.tut.ac.jp\/index.php?rest_route=\/wp\/v2\/pages\/18"}],"wp:attachment":[{"href":"https:\/\/gauss.int.ee.tut.ac.jp\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=66"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}